General information
We have scheduled the next AlOx MPW runs for 2025 and invite you to submit your mask designs to one of our MPW runs. These runs targets both UV-VIS and NIR applications. To take part in a run, use the registration link below. The upcoming MPW contains:
Design area options: 5 x 10 mm2 or 10 x 10 mm2
Thin MPW: 100 nm AlOx for UV-VIS wavelengths
Thick MPW: 400 nm AlOx for NIR wavelengths
For any request for custom design areas, please contact mpw@aluviaphotonics.com.
MPW schedule
MPW run 5
Registration deadline: 2024-12-31
Mask submission deadline: 2025-01-31
MPW run 6
Registration deadline: 2025-03-31
Mask submission deadline: 2025-04-30
MPW run 7
Registration deadline: 2025-06-30
Mask submission deadline: 2025-07-31
MPW run 8
Registration deadline: 2025-09-30
Mask submission deadline: 2025-10-31
Process design kit
To assist you in your design, we recommend utilizing the ALUVIA process design kit (PDK) that is co-developed with Epiphany Design using the xPDK format. The PDK, Design Rule Manual, and Design Rule Check script are available after registration. At this point, the PDK is still under major development. Over time, more standard building blocks, covering a large variety of wavelengths, will be added. Nevertheless, the parametrized building blocks can already be accesses through the ALUVIA PDK.
Registration form
Upcoming run: MPW run 5
Registration deadline: 31th December 2024
Mask submission deadline: 31th January 2025
